Constantin, Lucian AlexandruLucian AlexandruConstantinNitoi, InesInesNitoiCristea, IonutIonutCristeaOancea, PetrutaPetrutaOanceaOrbeci, CristinaCristinaOrbeciNechifor, Aurelia CristinaAurelia CristinaNechifor2017-03-302017-03-3020152537-5733http://hdl.handle.net/123456789/611Revista de Chimie (Bucuresti) Volume 66 Issue 5Triclosan (TCS) 5 chloro – 2 – (2, 4 – dichlorophenoxy) phenol is an antimicrobial agent widely used for personal care products. Due to TCS persistence and toxicity, advanced oxidation processes constitute nowadays an alternative to TCS degradation. The UV/TiO2 degradation of TCS was investigated in the following working conditions: pH domain = 5.3-8.7; initial pollutant concentration [TCS]0 = 1 – 13.5 mg/L; photocatalyst dose [TiO2]0 = 100 – 500 mg/L; irradiation time t = 30 – 180 min; air flow Q air = 50 L/h. The TCS degradation was found to respect the Langmuir – Hinshelwood model. The constant of the degradation rate and the equilibrium constant of TCS adsorption on TiO2 particles were calculated.en-USTriclosanPhotocatalysisTiO2AnatasePhoto-degradationArticle